GENERAL INFORMATION
IIT2010
The International Conference on Ion Implantation Technology (IIT) is a biannual international conference on ion implantation technology and is one of the largest conferences on ion beam material processing technology. The 18th IIT conference will be held in June 2010, at Kyoto - the center of Japanese tradition and history, and also the center of novel science and technology.
Conference poster
IIT2010 poster is available here.
download poster (IIT2010_poster_A4.pdf)
IIT2010 call for papers (IIT2010_Call_for_Papers.pdf)
Conference Topics
"Innovations in Ion Implantation"
Front line of Implant Technologies
Advanced Implant System, 32/22nm Device Manufacturing, 450mm Wafer,
Process Control and Yield, Plasma Doping, Cluster Ions, .....
Challenges for Non-planar Structure & Novel Device Technology
Conformal Doping, High Tilt Angle Implant, Advanced Anneal, S/D Engineering, Co-Implantation.....
Material Science
Ion-Solid Interaction, Modeling and Simulation, Defect Formation and Elimination,
Damage Control, Diffusion of Dopant and Other atoms,
III-V (GaAs, ...), Metrology, Nano Structure and Synthesis, Bio-Materials, .....
New Horizons in Ion Implantation
Power Devices (SiC, GaN, ...), Photovoltaics, FPD, MEMS, Non-Doping and Novel Application, .....
Supporting Organizations
The Japan Society of Applied Physics
(http://www.jsap.or.jp/english/index.html)
Materials Research Society of Japan
(http://www.mrs-j.org/English/e_index.html)
Kyoto University, Graduate School of Engineering
(http://www.t.kyoto-u.ac.jp/en)